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ArtikelMechanical Approach to Nanomachining of Silicon Using Oxide Characteristics Based on Tribo Nanolithography (TNL) in KOH Solution  
Oleh: Morita, Noboru ; Jeong, Woo Park ; Kawasegi, Noritaka ; Deug, Woo Lee
Jenis: Article from Journal - ilmiah internasional
Dalam koleksi: Journal of Manufacturing Science and Engineering vol. 126 no. 4 (Nov. 2004), page 801-806.
Topik: machining impact; mechanical approach; nano machining; oxide characteristics; nanolithography; solution
Ketersediaan
  • Perpustakaan Pusat (Semanggi)
    • Nomor Panggil: JJ93.6
    • Non-tandon: 1 (dapat dipinjam: 0)
    • Tandon: tidak ada
    Lihat Detail Induk
Isi artikelThe TNL (Tribo Nanolithography) method in aqueous solution uses the atomic force microscopy as a machining tool for the nanoscale fabrication of silicon. A specially designed cantilever with a diamond tip allows the formation of oxide patterns easily by a simple scratching process. A rectangular structure with a slope can be fabricated by a process in which a thin oxide layer rapidly forms in the substrate at the diamond - tip sample junction along the scanning path of the tip, and, simultaneously, the area uncovered with the oxide layer is being etched. Etching in KOH and HF is conducted to verify corrosion characteristics of oxide.
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