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ArtikelPrediction of The Circumferential Film Thickness Distribution in Horizontal Annular Gas-Liquid Flow  
Oleh: Newell, Ty A. ; Hurlburt, Evan T.
Jenis: Article from Bulletin/Magazine
Dalam koleksi: Journal of Fluids Engineering vol. 122 no. 2 (2000), page 396-402.
Topik: LIQUIDS; prediction; circumferential; film thick; horizontal annular; gas - liquid; flow
Ketersediaan
  • Perpustakaan Pusat (Semanggi)
    • Nomor Panggil: JJ89.1
    • Non-tandon: 1 (dapat dipinjam: 0)
    • Tandon: tidak ada
    Lihat Detail Induk
Isi artikelThis paper develops a liquid film symmetry correlation and a liquid film thickness distribution model for horizontal annular gas - liquid pipe flows. The symmetry correlation builds on the work of Williams et al. (1996) (Droplet Flux Distributions and Entrainment in Horizontal Gas - Liquid Flows," Int. J. Multiphase Flow, Vol. 22, pp. 1 – 18). A new correlating parameter is presented. The liquid film thickness model is based on the work of Laurinat et al. (1985) (Film Thickness Distribution for Gas - Liquid Annular Flow in a Horizontal Pipe," PhysicoChem. Hydrodynam., Vol. 6, pp. 179 – 195). The circumferential momentum equation is simplified to a balance between the normal Reynolds stress in the film's circumferential direction and the circumferential component of the weight of the film. A model for the normal Reynolds stress in the circumferential direction is proposed. The symmetry correlation is used to close the model equations. The model is valid for films with disturbance waves, and is shown to be applicable to air - water flows over a range of conditions from low velocity asymmetric to high velocity symmetric annular flows.
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