Fabrication and Characterization of Truly 3-D Diffuser / Nozzle Microstructures in Silicon  

Oleh:

Mullenborn, M. ; Heschel, M. ; Bouwstra, S.

Jenis: Article from Bulletin/Magazine
Dalam koleksi: Journal of Microelectro Mechanical System vol. 6 no. 1 (1997), page 41-47.
Topik: Characterization; fabrication; characterization; 3 - d; diffuser; nozzle; microstructures; silicon

Ketersediaan

Perpustakaan Pusat (Semanggi) Nomor Panggil: JJ30.2 Non-tandon: 1 (dapat dipinjam: 0) Tandon: tidak ada

Lihat Detail Induk

Isi artikel

We present microfabrication and characterization of truly three - dimensional (3 - D) diffuser / nozzle structures in silicon. Chemical vapor deposition (CVD), reactive ion etching (RIE), and laser - assisted etching are used to etch flow chambers and diffuser / nozzle elements. The flow behaviour of the fabricated elements and the dependence of diffuser /n ozzle efficiency on structure geometry has been investigated. The large freedom of 3 - D micromachining combined with rapid prototyping allows one to characterize and optimize diffuser / nozzle structures.

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