X-Ray Lathe : An X-Ray Lithographic Exposure Tool for Nonplanar Objects  

Oleh:

Lajos, R. E. ; Denton, D. D. ; White, V. ; Feinerman, A. D.

Jenis: Article from Bulletin/Magazine
Dalam koleksi: Journal of Microelectro Mechanical System vol. 5 no. 4 (1996), page 250-255.
Topik: OBJECTS; x - ray; lathe; litographic; exposure tool; non planar objects

Ketersediaan

Perpustakaan Pusat (Semanggi) Nomor Panggil: JJ30.1 Non-tandon: 1 (dapat dipinjam: 0) Tandon: tidak ada

Lihat Detail Induk

Isi artikel

An X - ray lithography lathe has been developed that can pattern cylindrical, ellipsoidal, and other non planar objects. This lathe is capable of patterning on a micron scale a wide variety of shapes including shapes impossible to achieve with a conventional lathe. A cylindrical core covered with a suitable resist is rotated while being exposed with a collimated X - ray source through a mask. The mask absorbs X rays up to a particular radius from the center of the core and the resist beyond that radius is removed in a developer. Several cylindrical cores were coated with poly(methylmethacrylate) (PMMA) 5 to 125 µm thick and patterned with X - rays down to a 250 - µm horizontal scale (along the lathe axis). The exposure time for a cylindrical PMMA layer is ~ three - four times longer than a planar layer with the same thickness. The capabilities of this technology, lathe apparatus, dose calculations, and initial exposure results are described.

Opini Anda

Klik untuk menuliskan opini Anda tentang koleksi ini!

Kembali