Surface-Micromachined Capacitive Differential Pressure Sensor With Lithographically Defined Silicon Diaphragm  

Oleh:

Tang, W. C. ; Zhang, Xia ; Mastrangelo, C. H.

Jenis: Article from Bulletin/Magazine
Dalam koleksi: Journal of Microelectro Mechanical System vol. 5 no. 2 (1996), page 98-105.
Topik: SURFACE CHEMISTRY; surface; micromachined; capacitive; differential pressure; sensor; lithographocaly; silicon; diaphragm

Ketersediaan

Perpustakaan Pusat (Semanggi) Nomor Panggil: JJ30.1 Non-tandon: 1 (dapat dipinjam: 0) Tandon: tidak ada

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Isi artikel

A capacitive surface - micromachined sensor suitable for the measurement of liquid and gas pressures was fabricated. The structure consists of a polysilicon stationary electrode suspended 0.7 µm above a 20 - µm - thick lightly doped silicon diaphragm formed by a patterned etch stop. The a priori patterning of the buried etch stop yields diaphragm widths independent of wafer thickness variations with excellent alignment. The design described here has a pressure range of 100 PSI, a nominal capacitance of 3.5 pF with a full scale span of 0.8 pF, and a temperature coefficient of 100 ppm °C(-1). Each device, including a matched reference capacitor, occupies 2.9 mm(2), yielding approximately 2000 devices per 100 - mm wafer.

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