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Surface-Micromachined Capacitive Differential Pressure Sensor With Lithographically Defined Silicon Diaphragm
Oleh:
Tang, W. C.
;
Zhang, Xia
;
Mastrangelo, C. H.
Jenis:
Article from Bulletin/Magazine
Dalam koleksi:
Journal of Microelectro Mechanical System vol. 5 no. 2 (1996)
,
page 98-105.
Topik:
SURFACE CHEMISTRY
;
surface
;
micromachined
;
capacitive
;
differential pressure
;
sensor
;
lithographocaly
;
silicon
;
diaphragm
Ketersediaan
Perpustakaan Pusat (Semanggi)
Nomor Panggil:
JJ30.1
Non-tandon:
1 (dapat dipinjam: 0)
Tandon:
tidak ada
Lihat Detail Induk
Isi artikel
A capacitive surface - micromachined sensor suitable for the measurement of liquid and gas pressures was fabricated. The structure consists of a polysilicon stationary electrode suspended 0.7 µm above a 20 - µm - thick lightly doped silicon diaphragm formed by a patterned etch stop. The a priori patterning of the buried etch stop yields diaphragm widths independent of wafer thickness variations with excellent alignment. The design described here has a pressure range of 100 PSI, a nominal capacitance of 3.5 pF with a full scale span of 0.8 pF, and a temperature coefficient of 100 ppm °C(-1). Each device, including a matched reference capacitor, occupies 2.9 mm(2), yielding approximately 2000 devices per 100 - mm wafer.
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