Vertical Mirrors Fabricated By Deep Reactive Ion Etching for Fiber-Optic Switching Applications  

Oleh:

Marxer, C. ; Thio, C. ; Gretillat, M.-A. ; Rooij, N. F. de ; Battig, R. ; Anthamatten, O. ; Valk, B. ; Vogel, P.

Jenis: Article from Bulletin/Magazine
Dalam koleksi: Journal of Microelectro Mechanical System vol. 6 no. 3 (1997), page 277-285.
Topik: FIBERS; vertical mirrors; reactive ion; fiber - optic; applications

Ketersediaan

Perpustakaan Pusat (Semanggi) Nomor Panggil: JJ30.2 Non-tandon: 1 (dapat dipinjam: 0) Tandon: tidak ada

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Isi artikel

We report on vertical mirrors fabricated by deep reactive ion etching of silicon. The mirror height is 75 µm, covering the fiber core of a single - mode fiber when the latter is placed into a groove of equal depth and etched simultaneously with the mirror. To obtain a uniform etch depth, etching is stopped on a buried oxide layer. Using the buried oxide as a sacrificial layer allows to fabricate mirrors with suspension and actuation structures as well as fiber - alignment grooves in one and the same processing step. A minimal mirror thickness of 2.3 µm was achieved, resulting in an aspect ratio higher than 30. The verticality was better than 89.3 °. In the upper part of the mirror a surface roughness below 40 nm rms was obtained. At a wavelength of 1300 nm the reflectivity of the aluminum-coated mirrors was measured to be higher than 76 %. Using a reactive ion etched mirror we have fabricated an optical fiber switch with electrostatic actuation. The coupling loss in the bar state of two packaged prototypes was between 0.6 and 1.7 dB and between 1.4 and 3.4 dB in the cross state. The switching time is below 0.2 ms.

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