Improvements to a Microelectronic Design and Fabrication Course  

Oleh:

Parent, David ; Basham, Eric ; Dessouky, Yasser ; Gleizner, Stacy ; Young, Gregory ; Allen, Emily

Jenis: Article from Journal - ilmiah internasional
Dalam koleksi: IEEE Transactions on Education vol. 48 no. 3 (Aug. 2005), page 497-502.
Topik: Complimentary; Metal-Oxide-Semiconductor (CMOS) Fabrication; Electronic Design Automation (EDA) Software; Multidisciplinary; Prerequisites; Semicustom Analog Design Flow

Ketersediaan

Perpustakaan Pusat (Semanggi) Nomor Panggil: II71.1 Non-tandon: 1 (dapat dipinjam: 0) Tandon: tidak ada

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Isi artikel

This paper presents improvements made to a complimentary metal–oxide–semiconductor (CMOS) fabrication laboratory course to increase student learning and student impact (enrollment). The three main improvements to the course discussed include: 1) use of a two-mask MOS process that significantly reduced the time students took previously to design, fabricate, and verify the electrical properties of a metal–oxide–semiconductor field-effect transistor (MOSFET) process; 2) students' use of a semicustom integrated circuit (IC) design that significantly reduced the average design and processing time of previous years; and 3) development and implementation of a system of course prerequisites, which allowed a larger number of students to enroll in the course.

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