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Microtechnology and Microsystems in Measurement Applications
Oleh:
Wolffenbuffel, R. F.
;
Mullem, C. J. van
Jenis:
Article from Bulletin/Magazine
Dalam koleksi:
IEEE Instrumentation & Measurement Magazine vol. 4 no. 3 (2001)
,
page 21-23.
Topik:
MEASUREMENTS
;
microtechnology
;
microsystems
;
measurement applications
Ketersediaan
Perpustakaan Pusat (Semanggi)
Nomor Panggil:
II47.2
Non-tandon:
1 (dapat dipinjam: 0)
Tandon:
tidak ada
Lihat Detail Induk
Isi artikel
Microtechnology has made inroads into metrology. MEMS structures in thermal RMS - to - DC conversion are at a mature stage. Many more applications are in their infancy and require more basic and applied research. Next to metrology, these may open doors to the higher performance instruments. A characteristic of MEMS is the reproducibility of the structure, which is important in metrology. Standard microelectronic processing and low - cost batch fabrication, which are often the main driving force in other applications areas, are less important in metrology because of the modest production volumes. Compatibility becomes an important issue when one tries to implement a reference element in a microsystem.
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