Heat Transfer and Phase Transformations in Laser Annealing of Thin  

Oleh:

Grigoropoulos, Costas P. ; Minghong, Lee ; Moon, Seung-Jae

Jenis: Article from Bulletin/Magazine
Dalam koleksi: Journal of Heat Transfer vol. 124 no. 2 (Apr. 2002), page 253-264.
Topik: transformation; heat tranfer; phase transformations; laser annealing; thin

Ketersediaan

Perpustakaan Pusat (Semanggi) Nomor Panggil: JJ90.3 Non-tandon: 1 (dapat dipinjam: 0) Tandon: tidak ada

Lihat Detail Induk

Isi artikel

Recrystallization of thin amorphous silicon (a - Si) films can yield polysilicon (p - Si) material with functional properties suitable for fabrication of electronic devices, including high definition large area active matrix liquid crystal displays. Pulsed laser - effected melting and recrystallization is exceptionally effective since it avoids damage to the underlying insulator structure. The ensuing phase transformations and ultimately the quality of the produced p - Si material strongly depend on the temperature history. This article presents a review of research aiming to understand the complex nucleation, resolidification and crystal growth phenomena that evolve under severely non - equilibrium conditions. It is shown that elucidation of the fundamental thermodynamic processes enables conception of novel practical thin film crystal growth techniques.

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