A Simulation-Based Correlation of Cross-Sectional Area of The Thin Film Produced by Laser Chemical Vapor Deposition With A Moving Laser Beam  

Oleh:

Yuwen, Zhang

Jenis: Article from Journal - ilmiah internasional
Dalam koleksi: Journal of Manufacturing Science and Engineering vol. 126 no. 4 (Nov. 2004), page 796-800.
Topik: fused deposition; simulation - based correlation; cross - sectional area; thin film; laser chemical; vapor deposition; laser beam

Ketersediaan

Perpustakaan Pusat (Semanggi) Nomor Panggil: JJ93.6 Non-tandon: 1 (dapat dipinjam: 0) Tandon: tidak ada

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Isi artikel

A parametric study on shape and cross - sectional area of the thin film produced by Laser Chemical Vapor Deposition (LCVD) with a moving laser beam is presented. The problem is formulated in the coordinate system that moves with the laser beam, and, therefore, the problem is a quasi - steady state. The effects of laser scanning velocity, laser power, and radius of the laser beam on the shapes of the deposited film are investigated. A simulation - based correlation of the cross - sectional area is proposed based on the simulation results.

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