XRD and SEM Investigation of the Influence of pH and Bath Temperature of Nickel Sulphide Thin Films  

Oleh:

Kassim, Anuar ; Min, Ho Soon ; Fei, Ngai Chee ; Saravanan, N.

Jenis: Article from Journal - ilmiah nasional - tidak terakreditasi DIKTI
Dalam koleksi: SIGMA: Jurnal Sains dan teknologi vol. 13 no. 2 (Jul. 2010), page 99-105.
Topik: Nickel Sulfide; X-ray Diffraction; Chemical Bath Deposition; Thin Films

Ketersediaan

Perpustakaan Pusat (Semanggi) Nomor Panggil: SS25 Non-tandon: 1 (dapat dipinjam: 0) Tandon: tidak ada

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Isi artikel

Nickel sulfide thin films were deposited onto microscope glass slide by chemical bath deposition technique from aqueous solutions containing nickel sulfate and sodium tiosulfate. The effects of pH and bath temperature toward the properties of the thin films were investigated. The deposited thin films were characterized with X-ray diffraction and scanning electron microscopy. For the films deposited at pH 1.5 and 40°C, the X-ray diffraction data suggested the formation of single phase which was NiS with hexagonal structure. However, the films prepared at longer period and higher bath temperature exhibited a mixture of cubic and hexagonal phase. These observations were supported by scanning electron microscopy results.

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