Flow Visualizations and Translet Temperature Measurements in An Axisymmetric Impinging Jet Rapid Thermal Chemical Vapor Deposition Reactor  

Oleh:

Mathews, A. G. ; Peterson, J. E.

Jenis: Article from Bulletin/Magazine
Dalam koleksi: Journal of Heat Transfer vol. 124 no. 3 (Jun. 2002), page 564-570.
Topik: visualization; flow visualizations; translet temperature; axisymmetric; jet rapid thermal; chemical vapor; deposition reactor

Ketersediaan

Perpustakaan Pusat (Semanggi) Nomor Panggil: JJ90.3 Non-tandon: 1 (dapat dipinjam: 0) Tandon: tidak ada

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Isi artikel

Carrier gas flow in a rapid thermal chemical vapor deposition (RTCVD) reactor was studied using flow visualization and laser induced Rayleigh light scattering (RLS). The flow field consists of a downward axisymmetric jet of carrier gas impinging on a wafer which undergoes transient heating. Flow visualization results showed three stable flow regimes as the surface rose from ambient to high temperature : momentum dominated, buoyancy dominated, and a second momentum dominated regime at high temperature ; each separated by unstable, chaotic flows. RLS temperature measurements provided transient gas temperature histories, documenting flow visualization results. Regions of momentum dominated, buoyancy dominated, and unstable flows were defined as a function of Grashof number, Reynolds number, pressure, and wafer temperature.

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