Simultaneous Multielement Analysis of Nonmetal Impurities in Uranium Oxide The Emission Spectrograph Method  

Oleh:

Simbolon, Sahat

Jenis: Article from Journal - ilmiah nasional - tidak terakreditasi DIKTI
Dalam koleksi: SIGMA: Jurnal Sains dan teknologi vol. 6 no. 2 (Jul. 2003), page 149-157.
Topik: Nonmetals; impurities; emission spectrograph method; uranium oxide; halogen

Ketersediaan

Perpustakaan Pusat (Semanggi) Nomor Panggil: SS25.4 Non-tandon: 1 (dapat dipinjam: 0) Tandon: tidak ada

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Isi artikel

An experiment to measure the concentration of nonmetal impurities was carried out using the emission spectrograph method. A 100 mg sample was mixed with 2 % of Ga2O3 and AgCl and excited with fixed 220V voltage, 10A current for 40 seconds. All the spectra were recorded using thorax film plate and processed in a dark room to produce a set of metal and nonmetal spectra from 2000 A to 4500 A. The element identification was done by calibrating the sample film plate compared to the standard one. For quantitative purposes, the intensities of the analyzed elements in the sample plate. It was found out that there were only two nonmetals, namely boron and silicon, which could be analyzed using the conventional method, whereas halogen elements could not be analyzed using the conventional method.

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