Kajian Struktur Kristal, Morfologi dan Magnetoresistansi Lapisan Tipis Alloy Nife Hasil Elektrodeposisi Pada Substrat Cu dan ITO  

Oleh:

Nurosyid, Fahru ; Nuryani ; Purnama, Budi ; Jannah, Erti Fatkul

Jenis: Article from Journal - ilmiah nasional - tidak terakreditasi DIKTI
Dalam koleksi: SIGMA: Jurnal Sains dan teknologi vol. 10 no. 2 (Jul. 2007), page 127-132.
Topik: magnetoresistance; electroplating; alloy NiFe; substrat Cu; indium tin oxide

Ketersediaan

Perpustakaan Pusat (Semanggi) Nomor Panggil: SS25.6 Non-tandon: 1 (dapat dipinjam: 0) Tandon: tidak ada

Lihat Detail Induk

Isi artikel

In this research the effect of Cu and indium tin oxide (ITO) substrates with respect to the growth of crystal structure, morphology structure, and magnetoresis¬tance ratio of thin film has been explored. The growth of NiFe thin film has been done by electrodeposition method. The crystal structure was analyzed using x-ray diffractometer (XRD), the morphology structure was examined using scanning electron microscope (SEM), and the magnetoresistance ratio was determined by two point probe method. The XRD spectrum showed that the substrate influences the crystal structure. The thin film produced was in the form of NiFe polycrystaiine with FCC (face center cubic) structure. The NiFe thin film formed crystal planes (111), (200), and (220) on Cu substrate, (111) and (200) on ITO substrate. The re¬sult of SEM showed that the surface morphology of the substrate has influenced the morphology structure of the thin film. The ratio of magnetoresistance of NiFe thin film was 8.9 % on Cu and 10.9 % on ITO substrate.

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